Corning Advanced-Flow: G1 photo reactor

Continuous flow reactor for pilot scale photochemistry applications

Reactor strengths

  • Pilot scale process
  • Wide chemical compatibility
  • Typical applications: pilot scale process, R&D, optimization for liq-liq, thermal and photochemistry applications
  • Simplified scalability to production with Corning technology
  • Excellent mixing and heat transfer properties
  • Tunable UV LED irradiation source available one multiple wavelength arrays
  • Efficient light penetration

Technical specifications

  • Wetted parts: glass, perfluorinated polymers, PEEK
  • Internal volume: 9 mL (per fluidic module)
  • Flow rates: 10 to 200 mL/min
  • Scale: several kg/day
  • Operating conditions: from -60 °C to 200 °C, up to 18 bar

Can your chemistry benefit from this equipment?

Ask us about how to apply this instrument to your process.